Focused Ion Beam

In the CrossBeam instruments from Zeiss an electron column (SEM) is combined with an ion beam column (FIB) to be able to cut in depth with gallium ions in addition to pure imaging. By opening the surface you gain information from the depth in nanometer resolution!

Through an automated sequence of cutting and imaging with subsequent reconstruction, three-dimensional tomographies are generated – an excellent method not only in biology, but in a wide range of applications in materials research.


With the ORION NanoFab, Zeiss is breaking new ground: Instead of electrons, helium or neon ions are used to image or process surfaces. 

If the system is supplemented with an additional gallium ion column a unique fabrication and patterning tool is created. Due to the incredibly fine ion beam and the different interaction with the sample, amazing results with extreme surface sensitivity are available.